Film-Thickness Measurement Tool Analyses Microscopic Areas of Large Samples

The 20/20 XL Film Thickness Measurement Tool has been designed to non-destructively analyse microscopic areas of very large samples. Developed for the semiconductor industry, this microspectrophotometer offers the ability to measure the thickness of thin films in both transmission and reflectance.

It also offers the ability to measure the Raman spectra of microscopic samples, along with ultraviolet and near-infrared microscopy of semiconductor and other types of samples. Its flexible design gives the 20/20 XL the ability to analyse the largest samples, with applications including mapping the thin-film thickness of large devices, locating and identifying contaminants, and measuring strain in silicon.

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