Release of NSR-S320F, ArF Scanner with the Streamlign Platform

Nikon Corporation (Makoto Kimura, President, Chiyoda-ku, Tokyo) released the latest ArF scanner, "NSR-S320F," with the concept of achieving high productivity and high accuracy.

NSR-S320F ensures early realization of stable operation and high productivity in the customers' fields with its platform proven in Nikon's immersion scanner.

VLSI chips, the backbone of the IT revolution, continue to shrink and get denser. The semiconductor industry is transitioning to development and high volume manufacturing of a 20 nm generation process device. The most critical layer is exposed with an ArF immersion scanner, but other critical layers as well as non-critical layers are normally exposed by an ArF scanner or KrF scanner.

NSR-S320F is the scanner that responds to the need for such a cutting-edge device. By employing Streamlign Platform, which has been proven in our immersion scanner, early realization of stable operation and high productivity is ensured.

Throughput is increased by an approximate factor of two compared to Nikon's existing scanners, and CoO (Cost of Ownership) has been significantly reduced. The level of overlay accuracy achieved is comparable to ArF immersion scanners, and it also has the potential for further expandability in the future.

Comments

Popular posts from this blog

What is Class I Division 2?

FUSE SIZING CONSIDERATIONS FOR HIGHER EFFICIENCY MOTORS

7/8 16UN Connectors that Provide 600 Volts and 15 Amps